Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication (2021)

Poly(styrene)-block-Maltoheptaose Films for Sub-10 nm Pattern Transfer: Implications for Transistor Fabrication. A. Löfstrand, R. Jafari Jam, K. Mothander, T. Nylander, M. Mumtaz, A. Vorobiev, W.C. Chen, R. Borsali, I. Maximov. Solid State PhysicsNanoLund: Center for NanosciencePhysical Chemistry, (2021) https://doi.org/10.1021/acsanm.1c00582